Image courtesy of AVS website

The American Vacuum Society (AVS) International Symposium and Exhibition serves as a leading forum for the exchange of advances in atomic-scale processing, characterization, measurement, and simulation of materials, surfaces, interfaces, and devices. Spanning fundamental science to manufacturing, the weeklong Symposium brings together participants from industry, government laboratories, and academia in a multidisciplinary setting to share and explore research across vacuum technology, thin films, plasma science, microelectronic devices, quantum computing, 2D materials, nanostructures, biomaterials, and surface and interfacial phenomena, among other areas. The School of Materials Science and Engineering’s (MSE) Mark Losego will chair this year’s symposium. 

Losego recently participated in a Q&A for the symposium. Read it on the AVS72 website.