Cornell University
Event Type:
MSE Seminar
Talk Title:
Extreme UV Patterning for Fast Electronics: Making materials vanish with nm-scale precision
College of Computing Building Room 16, Georgia Tech 


The next generation of microelectronics will depend on photoresists working at EUV wavelength (13 nm). Photochemistry as we know it is no longer relevant and the role of stochastics (chemical heterogeneity) becomes increasingly important. New concepts in photoresists are needed to form high resolution, high image-fidelity patterns while operating under demanding exposure conditions. Here we report three possible approaches to EUV photoresists: 1) metal-organic cluster resists, 2) chain scission resists and 3) controlled sequence photoresists. Metal organic photoresists enable high resolution patterning and address the need for higher absorbing elements in EUV resists. In contrast, chain scission resists from poly(phthalaldehyde)s enable pattern formation through resist depolymerization. Finally, sequence-controlled resists derived from peptoids may enable outstanding performance through chain sequence control and placement of moieties at specific locations in the polymer. Each of these strategies will be discussed in terms of their state of the art.


Christopher Kemper Ober is the Francis Bard Professor of Materials Engineering at Cornell University. He received his B.Sc. (Honours Chemistry) from the University of Waterloo, Canada and his PhD in Polymer Science & Engineering at UMass Amherst. After several years at the Xerox Research Centre of Canada working in marking technology, Ober arrived at Cornell University in 1986. His research is focused on lithography, patterning, the biology materials interface, and control of surface structure in thin films. Ober was elected to the National Academy of Engineering in 2023 in part for his work on photolithography. Ober was honored in 2015 with the Photopolymer Science & Technology Outstanding Contribution Award. He is the 2006 winner of the American Chemical Society Award in Applied Polymer Science and received a Humboldt Research Prize in 2007. In 2009, Ober was named a Fellow of the American Chemical Society and was awarded the Gutenberg Research Prize by the University of Mainz. From 1995 to 2010 he was an associate editor of the ACS journal Macromolecules. Ober served as Interim Dean of Engineering 2009 - 2010. In 2014 he was a JSPS Fellow in Japan. More recently he was elected a fellow of the American Physical Society (2014) and the American Association for the Advancement of Science (2015) and made a SPIE Senior Member (2018). He recently stepped down as the Director of the Cornell Nanoscale Facility.